Resistivity: High resistivity > 1 × 10⁶ Ω·cm
Size: 4–8 inches
Thickness: 500 μm wafer
Features:
Enhances the power-handling capability of RF devices, with excellent high-temperature performance, thermal conductivity, and electric-field breakdown strength. Enables up to 10× higher power density compared with silicon-based devices.
Applications:
High-frequency / high-power devices, next-generation 5G communications, and transportation applications.
Specification Request: sales.taisicmaterials.com
Third-Generation Semiconductor: Silicon Carbide (SiC)
Semi-insulating SiC Substrates
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Semi-Insulating SiC Substrates | 4" / 6" / 8"
